Electron drift velocity in silicon

C. Canali, C. Jacoboni, F. Nava, G. Ottaviani, and A. Alberigi-Quaranta
Phys. Rev. B 12, 2265 – Published 15 September 1975
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Abstract

Experimental results for electrons obtained with the time-of-flight technique are presented for temperatures between 8 and 300°K and fields ranging between 1.5 and 5 × 104 V cm1 oriented along 111, 110, and 100 crystallographic directions. At 8°K the dependence of the transit time upon sample thickness has allowed a measurement of the valley repopulation time when the electric field is 100 oriented. These experimental results have been interpreted with Monte Carlo calculations in the same ranges of temperature and field. The theoretical model includes the many-valley structure of the Si conduction band, acoustic intravalley scattering with correct momentum and energy relaxation and correct equilibrium phonon population, several intervalley scatterings, and ionized impurity scattering.

  • Received 16 October 1974

DOI:https://doi.org/10.1103/PhysRevB.12.2265

©1975 American Physical Society

Authors & Affiliations

C. Canali, C. Jacoboni, F. Nava, G. Ottaviani, and A. Alberigi-Quaranta

  • Istituto di Fisica dell'Università, Modena, Italy

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Issue

Vol. 12, Iss. 6 — 15 September 1975

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