Abstract
Photoemission studies ( eV) of room-temperature formation of the Si-Cr interface show reactive behavior with atomic intermixing and dramatic modifications of the metal-derived density of states. Self-consistent augmented-spherical-wave calculations of the total and -projected densities of states for the silicides Si, CrSi, and Cr in simplified cubic lattice structures allow an identification of general trends in the electronic structure upon Si-Cr heteropolar bond formation. These experimental and theoretical results suggest an interface morphology where a Si-rich intermixed phase is present for a depth of monolayers between the Si crystal and the unreacted Cr film. Evidence of Si segregation in the top layers of the Cr film is provided.
- Received 16 November 1981
DOI:https://doi.org/10.1103/PhysRevB.25.4981
©1982 American Physical Society