Theory and experiment on the 1/fγ noise in p-channel metal-oxide-semiconductor field-effect transistors at low drain bias

Charles Surya and Thomas Y. Hsiang
Phys. Rev. B 33, 4898 – Published 1 April 1986
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Abstract

Voltage noises with power spectra of the form 1/fγ were studied in a series of custom and commercial p-channel metal-oxide-semiconductor field-effect transistors. Detailed measurements of the time-correlation functions indicated that the noise originated from a stationary and Gaussian source. The spatial correlation function, measured in devices made with extra voltage probes placed in the conduction channels, showed no measurable amount of correlation down to a distance of 7 μm, excluding the possibility of a diffusion mechanism for the noise. The results, combined with the experimental data on the dependence of the noise power spectra on the bias conditions, led us to establish a simple model based on a variation of the ‘‘McWhorter model’’ to account for the noise. Built into the model was an energy dependence of the trap concentration which in turn yielded a spatial dependence in the presence of a gate bias. This model explained quantitatively the experimentally observed change in the exponent γ of the noise spectrum as the gate bias was varied. It was then meaningful to compare the experimental and computed noise powers at a single, fixed frequency.

  • Received 10 May 1985

DOI:https://doi.org/10.1103/PhysRevB.33.4898

©1986 American Physical Society

Authors & Affiliations

Charles Surya and Thomas Y. Hsiang

  • Department of Electrical Engineering, The University of Rochester, Rochester, New York 14627

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Issue

Vol. 33, Iss. 7 — 1 April 1986

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