Mobility of the two-dimensional electron gas at selectively doped n -type AlxGa1xAs/GaAs heterojunctions with controlled electron concentrations

Kazuhiko Hirakawa and Hiroyuki Sakaki
Phys. Rev. B 33, 8291 – Published 15 June 1986
PDFExport Citation

Abstract

We describe our systematic study of the two-dimensional electron mobilities μ of n-type AlxGa1xAs/GaAs heterojunctions, in particular their dependence on the electron concentration Ns and the temperatures T, in a variety of field-effect transistors in which the impurity locations are precisely controlled to vary μ over the wide range of 5×103 to 1.5×106 cm2/V s. It is found that μ increases with increasing Ns in the temperature range of 10 to 300 K. The measured mobilities are compared with theoretical calculations. The observed dependence of μ on Ns at low temperatures is shown to be in excellent agreement with the theory of ionized-impurity scattering, whereas the high-temperature data disagree with the existing theory of polar-optical phonon scattering. A quantitative study has been successfully made on the effect of an undoped AlxGa1xAs spacer layer, which enhances not only μ itself but also the slope in logμ-logNs characteristics. The presence of both positive and negative temperature dependences of μ at low temperatures (T<40 K) is noted, and its connection with the effects of nondegeneracy and lattice scattering is also discussed.

  • Received 16 December 1985

DOI:https://doi.org/10.1103/PhysRevB.33.8291

©1986 American Physical Society

Authors & Affiliations

Kazuhiko Hirakawa and Hiroyuki Sakaki

  • Institute of Industrial Science, The University of Tokyo, 7-22-1 Roppongi, Minato-ku, Tokyo 106, Japan

References (Subscription Required)

Click to Expand
Issue

Vol. 33, Iss. 12 — 15 June 1986

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×