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Tunneling through indirect-gap semiconductor barriers

E. E. Mendez, E. Calleja, and W. I. Wang
Phys. Rev. B 34, 6026(R) – Published 15 October 1986
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Abstract

Tunneling-current measurements in Ga1xAlxAsGaAsGa1xAlxAs heterostructures under hydrostatic pressure show that nonresonant tunneling occurs preferentially through the lowest potential barrier, while resonant tunneling is determined solely by a Γ-point profile. For fixed voltages, the low-temperature current through a 100 Å-40 Å-100 Å structure with Ga0.60Al0.40As barriers increased with pressure, up to 11 kbar. The rate of increase showed an abrupt rise at ∼4 kbar, which is attributed to tunneling through a ΓX barrier. This interpretation is consistent with a rapid increase of the tunneling current in AlAs-GaAs-AlAs, even at low pressures. On the other hand, a negative-resistance feature associated with resonant tunneling via quantum-well states, shifted smoothly to lower voltages with pressure, indicating that the energy of the confined states is established by a pressure-dependent Γ-point profile.

  • Received 3 July 1986

DOI:https://doi.org/10.1103/PhysRevB.34.6026

©1986 American Physical Society

Authors & Affiliations

E. E. Mendez, E. Calleja*, and W. I. Wang

  • IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598

  • *Permanent address: Escuela Tecnica Superior de Ingenieros de Telecomunicacion, Universidad Politecnica, Madrid, Spain.

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Issue

Vol. 34, Iss. 8 — 15 October 1986

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