Macroscopic physics of the silicon inversion layer

M. G. Ancona and H. F. Tiersten
Phys. Rev. B 35, 7959 – Published 15 May 1987
PDFExport Citation

Abstract

The diffusion-drift description of electrons and holes in a semiconductor is frequently used to obtain a detailed understanding of the physics and engineering of semiconductor devices. We show that, by generalizing the equation of state of the electron gas to include density-gradient dependences, this standard description can be extended to describe much of the quantum-mechanical behavior exhibited by strong inversion layers.

  • Received 29 September 1986

DOI:https://doi.org/10.1103/PhysRevB.35.7959

©1987 American Physical Society

Authors & Affiliations

M. G. Ancona

  • Code 6813, Naval Research Laboratory, Washington D.C. 20375

H. F. Tiersten

  • Department of Mechanical Engineering, Rensselaer Polytechnic Institute, Troy, New York 12181

References (Subscription Required)

Click to Expand
Issue

Vol. 35, Iss. 15 — 15 May 1987

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×