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Fabrication of a GaAs quantum-well-wire structure by Ga focused-ion-beam implantation and its optical properties

Y. Hirayama, S. Tarucha, Y. Suzuki, and H. Okamoto
Phys. Rev. B 37, 2774(R) – Published 15 February 1988
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Abstract

A quantum-well wire was fabricated with use of local intermixing of a GaAs-AlxGa1xAs single-quantum-well epitaxial layer induced by Ga focused-ion-beam implantation. Fine structures were observed in low temperature photoluminescence and photoluminescence excitation spectra. These fine structures are explained by the density of states specific to the two-dimensionally confined carrier system.

  • Received 22 September 1987

DOI:https://doi.org/10.1103/PhysRevB.37.2774

©1988 American Physical Society

Authors & Affiliations

Y. Hirayama, S. Tarucha, Y. Suzuki, and H. Okamoto

  • Musashino Electrical Communications Laboratories, Nippon Telegraph n Telephone Corporation, 3-9-11 Midori-cho, Musashino-shi, Tokyo 180, Japan

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Issue

Vol. 37, Iss. 5 — 15 February 1988

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