Infrared absorption studies of the divacancy in silicon: New properties of the singly negative charge state

J. H. Svensson, B. G. Svensson, and B. Monemar
Phys. Rev. B 38, 4192 – Published 15 August 1988
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Abstract

The infrared optical absorption peak at 0.34 eV in silicon, which is usually associated with the singly negative charge state of the divacancy, has been investigated in electron-irradiated samples with use of different optical excitation conditions. It is proposed that a strong Jahn-Teller distortion makes it possible to populate this charge state, when the defect initially is in the neutral charge state, either by the capture of a photoexcited free electron from the conduction band, or by the direct photoexcitation of an electron from the valence band to a defect orbital. Experimental evidence for the existence of these reactions is presented. A defect level at Ec-0.54 eV, frequently associated with the singly negative charge state of the divacancy, is identified as one of the levels from which these photoexcited free electrons originate. The 0.34-eV peak is attributed to an internal transition in the singly negative charge state of the divacancy center, implying the existence of a shallow defect state at approximately Ec-0.07 eV for this charge state. Experimental support is given for the existence of this shallow state. A tentative explanation, based on the strong Jahn-Teller distortion of the singly negative charge state, is suggested for the fact that the doubly negative charge state is not observed at temperatures below 90 K.

  • Received 30 March 1988

DOI:https://doi.org/10.1103/PhysRevB.38.4192

©1988 American Physical Society

Authors & Affiliations

J. H. Svensson, B. G. Svensson, and B. Monemar

  • Department of Physics and Measurement Technology, Linköping University, S-581 83 Linköping, Sweden

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Issue

Vol. 38, Iss. 6 — 15 August 1988

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