Correlation of the 5.0- and 7.6-eV absorption bands in SiO2 with oxygen vacancy

Ryoichi Tohmon, Hiroyasu Mizuno, Yoshimichi Ohki, Kotoku Sasagane, Kaya Nagasawa, and Yoshimasa Hama
Phys. Rev. B 39, 1337 – Published 15 January 1989
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Abstract

Various uv and vacuum-uv optical-absorption bands found in as-manufactured high-purity SiO2 glass were studied. Two types of absorption bands were found near 5.0 eV, one of which is attributed to the oxygen vacancy (?Si-Si?). The absorption band at 7.6 eV is also found to be caused by the same oxygen vacancy. Observation of the decay lifetime of photoluminescence and calculations using the ab initio molecular-orbital program show that the 7.6-eV band is caused by a singlet-to-singlet transition, while the 5.0-eV band is caused by a singlet-to-triplet transition.

  • Received 30 August 1988

DOI:https://doi.org/10.1103/PhysRevB.39.1337

©1989 American Physical Society

Authors & Affiliations

Ryoichi Tohmon, Hiroyasu Mizuno, and Yoshimichi Ohki

  • Department of Electrical Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169, Japan

Kotoku Sasagane

  • Department of Chemistry, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169, Japan

Kaya Nagasawa

  • Department of Electrical Engineering, Sagami Institute of Technology, 1-1-25 Tsujido-nishi-kaigan, Fujisawa, Kanagawa 251, Japan

Yoshimasa Hama

  • Science and Engineering Research Laboratory, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169, Japan

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Vol. 39, Iss. 2 — 15 January 1989

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