Dynamical low-energy electron-diffraction analysis of bismuth and antimony epitaxy on GaAs(110)

W. K. Ford, T. Guo, D. L. Lessor, and C. B. Duke
Phys. Rev. B 42, 8952 – Published 15 November 1990
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Abstract

The atomic geometry of Bi adsorbed on GaAs(110) is determined using low-energy electron diffraction (LEED) and compared with calculated atomic geometries of GaAs(111)-p(1×1)-Sb and clean GaAs(110). The analysis of the one-monolayer, epitaxical films is facilitated by comparing LEED intensity data measured for each system under identical experimental conditions and analyzed using a common multiple-scattering model. The overlapping chain geometry, recently proposed as a possible alternative to the previously determined geometry for the GaAs(110)-p(1×1)-Sb system, was tested for both the Sb and Bi systems. Comprehensive multiple-scattering calculations indicate, however, that the previously determined geometry provides the superior fit to the LEED intensity measurements. Several improvements to the LEED analysis methodology, including simultaneous multidimensional optimization, are described.

  • Received 14 June 1990

DOI:https://doi.org/10.1103/PhysRevB.42.8952

©1990 American Physical Society

Authors & Affiliations

W. K. Ford and T. Guo

  • Advanced Materials Center and Department of Physics, Montana State University, Bozeman, Montana 59717

D. L. Lessor

  • Pacific Northwest Laboratory, Richland, Washington 99352

C. B. Duke

  • Xerox Webster Research Center, 800 Phillips Road, 0114-38D, Webster, New York 14580

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Vol. 42, Iss. 14 — 15 November 1990

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