Surface-plasmon field-enhanced multiphoton photoelectric emission from metal films

T. Tsang, T. Srinivasan-Rao, and J. Fischer
Phys. Rev. B 43, 8870 – Published 15 April 1991
PDFExport Citation

Abstract

We report a study of surface-plasmon-mediated multiphoton photoelectric emission from thin films of Ag, Au, Cu, and Al. The experiments were performed in the Kretchmann attenuated-total-internal reflection geometry while the excitation source was an unamplified femtosecond colliding-pulse mode-locked ring laser. Contrast to the electron emission obtained by irradiating the laser on a metal surface, electron yield increases by several orders of magnitude with fairly high quantum efficiency, is observed when photons are coupled to the surface-plasmon modes of these films. Although the photon absorption reaches its maximum when the reflectivity exhibits a deep minimum at the surface-plasmon resonance angle, it is found that the maximum electron yield occurs at a slightly different angle than the reflectivity dip. The results of these measurements favor the field-density calculations using the Fresnel equations. The width of the electron temporal profile, measured utilizing this nonlinear photoelectric effect, however, fails to show the narrowing commensurate with the higher-order nonlinearity.

  • Received 29 June 1990

DOI:https://doi.org/10.1103/PhysRevB.43.8870

©1991 American Physical Society

Authors & Affiliations

T. Tsang, T. Srinivasan-Rao, and J. Fischer

  • Brookhaven National Laboratory, Upton, New York 11973

References (Subscription Required)

Click to Expand
Issue

Vol. 43, Iss. 11 — 15 April 1991

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×