Electron-phonon scattering rates in disordered metallic films below 1 K

P. M. Echternach, M. R. Thoman, C. M. Gould, and H. M. Bozler
Phys. Rev. B 46, 10339 – Published 15 October 1992
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Abstract

We have studied thin disordered metal films at low temperatures under nonequilibrium conditions. The electron temperature was raised above the lattice temperature by applying a dc bias. The Coulomb anomaly and weak localization were used as thermometers for the electrons. We confirm that at temperatures below 1 K the electron temperatures as derived from either the Coulomb anomaly or weak localization are consistent. The electron-phonon energy relaxation rate was measured to be proportional to T3. Our results disagree with theoretical calculations of the electron-phonon rates for dirty metals which predict electron-phonon scattering rates proportional to T4 for three-dimensional phonons.

  • Received 9 June 1992

DOI:https://doi.org/10.1103/PhysRevB.46.10339

©1992 American Physical Society

Authors & Affiliations

P. M. Echternach, M. R. Thoman, C. M. Gould, and H. M. Bozler

  • Department of Physics, University of Southern California, Los Angeles, California 90089-0484

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Vol. 46, Iss. 16 — 15 October 1992

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