Nanometer-resolved lateral variations in the Schottky barrier height (SBH) formed at a chemically prepared Au/n-type GaAs interface were measured using ballistic-electron-emission microscopy (BEEM). The spatial profile and the statistical distribution of the SBH’s thus obtained were compared to current-voltage (IV) and capacitance-voltage (CV) characteristics of the same metal-semiconductor contact. This comparison showed that the macroscopic SBH obtained from the IV measurements can be successfully interpreted using the parallel conduction model applied to the BEEM-derived distribution, if the effect of thermionic field emission is included. The SBH obtained from the CV measurements is greater than the mean value obtained from BEEM measurements by nearly the image-force lowering expected for a Au/GaAs diode.

• Received 15 December 1993

DOI:https://doi.org/10.1103/PhysRevB.49.16474