Local strain in interface: Origin of grain tilting in diamond (001)/silicon (001) heteroepitaxy

X. Jiang, R. Q. Zhang, G. Yu, and S. T. Lee
Phys. Rev. B 58, 15351 – Published 15 December 1998
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Abstract

Diamond grain tilting, one of the central problems of diamond heteroepitaxy on silicon (001) surface, has been studied by means of atomic-force and high-resolution electron microscopic observations, and by theoretical simulation using the molecular-orbital method. It is shown that, due to interface mismatch-induced local lattice strain and three-dimensional stacking, diamond nucleation in small areas results naturally in grain tilting. For more perfect heteroepitaxy, nucleation with reduced silicon surface damage and over relatively large lateral domains is required.

  • Received 3 April 1998

DOI:https://doi.org/10.1103/PhysRevB.58.15351

©1998 American Physical Society

Authors & Affiliations

X. Jiang*, R. Q. Zhang, G. Yu, and S. T. Lee

  • Department of Physics and Materials Science, City University of Hong Kong, Kowloon, Hong Kong, China

  • *Permanent address: Fraunhofer Institut für Schicht und Oberflächentechnik, Bienroder Weg 54E, D-38108 Braunschweig, F.R. Germany.
  • Author to whom correspondence should be addressed. FAX: +852-2788-7830. Electronic address: APRQZ@cityu.edu.hk

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Vol. 58, Iss. 23 — 15 December 1998

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