Carbon nitride deposited using energetic species: A review on XPS studies

C. Ronning, H. Feldermann, R. Merk, H. Hofsäss, P. Reinke, and J.-U. Thiele
Phys. Rev. B 58, 2207 – Published 15 July 1998
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Abstract

This paper reviews x-ray photoelectron spectroscopy studies on carbon nitride (CN) and reports on results obtained from CN thin films prepared by mass selected ion-beam deposition. The core-level spectra of samples deposited at room temperature show that nitrogen is incorporated into the amorphous network in two different bonding configurations; carbon has three main bonding configurations whose relative contributions vary as a function of the nitrogen content. For samples deposited at elevated temperatures an ordering of the amorphous CN network towards a crystalline graphitelike structure is observed. Furthermore, both deposition at elevated temperatures (350 °C) and post-deposition ion irradiation have a strong influence on the bonding configuration in the CN films. Based on these results and the results reported in the reviewed literature a picture of the microstructure of carbon nitride deposited using energetic species is developed.

  • Received 20 October 1997

DOI:https://doi.org/10.1103/PhysRevB.58.2207

©1998 American Physical Society

Authors & Affiliations

C. Ronning*, H. Feldermann, R. Merk, and H. Hofsäss

  • Universität Konstanz, Fakultät für Physik, Postfach 5560, D-78457 Konstanz, Germany

P. Reinke

  • Universität Basel, Institut für Physik, Klingelbergstrasse 82, CH-4056 Basel, Switzerland

J.-U. Thiele

  • IBM Almaden Research Center, San Jose, California 95120-6099

  • *Present address: Department of Materials Science and Engineering, North Carolina State University, Box 7919, Raleigh, NC 27695-7919. Electronic address: Carsten_Ronning@ncsu.edu

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Vol. 58, Iss. 4 — 15 July 1998

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