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Quantum confined Stark effect due to built-in internal polarization fields in (Al,Ga)N/GaN quantum wells

M. Leroux, N. Grandjean, M. Laügt, J. Massies, B. Gil, P. Lefebvre, and P. Bigenwald
Phys. Rev. B 58, R13371(R) – Published 15 November 1998
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Abstract

(Al,Ga)N/GaN quantum wells have been studied by temperature-dependent luminescence and reflectivity. The samples were grown by molecular beam epitaxy on (0001) sapphire substrates, and well widths were varied from 3 to 15 monolayers (ML’s) with a 2-ML increment, thus providing a reliable data set for the study of the well width dependence of transition energies. The latter shows a strong quantum confined Stark effect for wide wells, and an internal electric-field strength of 450 kV/cm is deduced. X-ray diffraction performed on the same samples shows that the GaN layers are nearly unstrained, whereas the (Al,Ga)N barriers are pseudomorphically strained on GaN. We conclude that the origin of the electric field is predominently due to spontaneous polarization effects rather than a piezoelectric effect in the well material.

  • Received 13 May 1998

DOI:https://doi.org/10.1103/PhysRevB.58.R13371

©1998 American Physical Society

Authors & Affiliations

M. Leroux, N. Grandjean, M. Laügt, and J. Massies

  • CNRS-Centre de Recherche sur l’ Hétéro-Epitaxie et ses Applications, Rue B. Grégory, 06560 Valbonne, France

B. Gil and P. Lefebvre

  • CNRS-Groupe d’ Etude des Semiconducteurs, Université de Montpellier II, Case Courrier 074, 34095 Montpellier Cedex 5, France

P. Bigenwald

  • Laboratoire de Physique des Matériaux, Université d’ Avignon, 84000 Avignon, France

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Vol. 58, Iss. 20 — 15 November 1998

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