Micron-scale modifications of Si surface morphology by pulsed-laser texturing

T. Schwarz-Selinger, David G. Cahill, S.-C. Chen, S.-J. Moon, and C. P. Grigoropoulos
Phys. Rev. B 64, 155323 – Published 27 September 2001
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Abstract

The morphologies of Si surfaces are modified with single, tightly focused nanosecond laser pulses and characterized by atomic force microscopy (AFM). Dimple-shaped features with diameters 14μm and depths 1–300 nm are produced by varying the laser-spot diameter and the peak energy densities F0 in the range 0.4<F0<1.3Jcm2. Greater control of the depth of shallow dimples and quantitative comparison of theory and experiment is enabled by first removing the native oxide of Si with dilute HF acid. We develop approximate analytical solutions for two-dimensional fluid-flow driven by gradients in the surface tension; these solutions provide fundamental insight on how the morphology depends on laser parameters and the thermophysical properties of the melt and its surface. Quantitative comparisons between theory and experiment are enabled by using numerical simulations of heat flow in one-dimension as inputs to the analytical fluid-flow equations; we find good agreement with AFM data for the dimple shape and depth.

  • Received 22 February 2001

DOI:https://doi.org/10.1103/PhysRevB.64.155323

©2001 American Physical Society

Authors & Affiliations

T. Schwarz-Selinger

  • Centre for Interdisciplinary Plasma Science, Max-Planck-Institut für Plasmaphysik, D-85748 Garching, Germany,
  • the Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801

David G. Cahill

  • Department of Material Science and Engineering and the Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801

S.-C. Chen*, S.-J. Moon, and C. P. Grigoropoulos

  • Department of Mechanical Engineering, University of California, Berkeley, California 94720-1740

  • *Present address: Industrial and Manufacturing Systems Engineering Department, 2019 Black Engineering, Iowa State University, Iowa 50011.

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Issue

Vol. 64, Iss. 15 — 15 October 2001

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