Dissipative continuum model for self-organized pattern formation during ion-beam erosion

S. Facsko; T. Bobek; A. Stahl; H. Kurz; T. Dekorsy

doi:10.1103/PhysRevB.69.153412

Dissipative continuum model for self-organized pattern formation during ion-beam erosion

S. Facsko, T. Bobek, A. Stahl, H. Kurz, and T. Dekorsy

Phys. Rev. B 69, 153412 – Published 29 April 2004

Abstract

A continuum model, based on the damped Kuramoto-Sivashinsky equation, is shown to reproduce the morphology evolution during ion sputtering quite successfully. In a very narrow range of the damping parameter $α,$ the alignment of the structures into hexagonal domains is obtained under normal incidence of ions with striking resemblance to the experimentally observed dot patterns. The origin of this damping factor is discussed.

Received 24 November 2003

DOI:https://doi.org/10.1103/PhysRevB.69.153412

Authors & Affiliations

S. Facsko^*, T. Bobek, A. Stahl, and H. Kurz

Lehrstuhl und Institut für Halbleitertechnik, Rheinisch-Westfälische Technische Hochschule Aachen, Sommerfeldstrasse 24, 52056 Aachen, Germany

T. Dekorsy

Institut für Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf, 01314 Dresden, Germany

^*Present address: Institut für Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf, P.O. Box 510119, 01314 Dresden, Germany. Electronic address: S.Facsko@ fz-rossendorf.de

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Vol. 69, Iss. 15 — 15 April 2004

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Physical Review B

covering condensed matter and materials physics