Growth behavior of metal-doped silicon clusters SinM(M=Ti,Zr,Hf;n=816)

Hiroaki Kawamura, Vijay Kumar, and Yoshiyuki Kawazoe
Phys. Rev. B 71, 075423 – Published 25 February 2005

Abstract

The growth behavior of metal-doped silicon clusters MSin,M=Ti, Zr, and Hf and n=816 is studied using an ab initio ultrasoft pseudopotential plane wave method and the generalized gradient approximation for the exchange-correlation energy. For n=812, we find basketlike open structures to be most favorable, while for n=1316, the metal atom is completely surrounded by silicon atoms. These results are in excellent agreement with the observed reactivity of these clusters. Our results suggest continuous aggregation until n=16, which is the optimal cage for the metal-encapsulated silicon clusters with these elements. Further calculations have been done on cation and anion clusters using the Gaussian method. The calculated electron affinities agree well with experimental results in the range of n=1216 while the calculated values for smaller clusters are higher. Raman activity and infrared spectra have been calculated for selected clusters. These could help in the identification of the structures of these clusters from experiments.

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  • Received 23 March 2004

DOI:https://doi.org/10.1103/PhysRevB.71.075423

©2005 American Physical Society

Authors & Affiliations

Hiroaki Kawamura1, Vijay Kumar1,2, and Yoshiyuki Kawazoe1

  • 1Institute for Materials Research (IMR), Tohoku University, 2-1-1 Katahira Aoba-ku, Sendai 980-8577, Japan
  • 2Dr. Vijay Kumar Foundation, 45 Bazaar Street, K.K. Nagar (West), Chennai 600 078, India

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Vol. 71, Iss. 7 — 15 February 2005

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