Formation mechanism of surface relief structures on amorphous azopolymer films

Ke Yang, Suizhou Yang, and Jayant Kumar
Phys. Rev. B 73, 165204 – Published 6 April 2006

Abstract

The electromagnetic force from two interfering light beams on isotropic materials is derived for surface relief grating formation processes. The Navier-Stokes equation is solved for the electromagnetic force induced motion inside the “photoplasticized” amorphous azopolymer film. The predicted inscription rates and surface velocities in surface relief grating formation processes are consistent with the experimental evidences, indicating that the surface relief gratings on amorphous azopolymer films are formed by the electromagnetic force on the materials, under the condition of “photoplasticization” through sufficient trans-cis-trans isomerization cycling.

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  • Received 26 July 2005

DOI:https://doi.org/10.1103/PhysRevB.73.165204

©2006 American Physical Society

Authors & Affiliations

Ke Yang1, Suizhou Yang2, and Jayant Kumar1

  • 1Department of Physics and Applied Physics, Center for Advanced Materials, University of Massachusetts Lowell, Lowell, Massachusetts 01854, USA
  • 2Department of Chemistry, Center for Advanced Materials, University of Massachusetts Lowell, Lowell, Massachusetts 01854, USA

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Issue

Vol. 73, Iss. 16 — 15 April 2006

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