Interatomic potential for the Cu-Ta system and its application to surface wetting and dewetting

Adham Hashibon, Alexander Y. Lozovoi, Yuri Mishin, Christian Elsässer, and Peter Gumbsch
Phys. Rev. B 77, 094131 – Published 25 March 2008

Abstract

An angle-dependent interatomic potential has been developed for the Cu-Ta system by crossing two existing potentials for pure Cu and Ta. The cross-interaction functions have been fitted to first-principles data generated in this work. The potential has been extensively tested against first-principles energies not included in the fitting database and applied to molecular dynamics simulations of wetting and dewetting of Cu on Ta. We find that a Cu film placed on a Ta (110) surface dewets from it, forming a Cu droplet on top of a stable Cu monolayer. We also observe that a drop of liquid Cu placed on a clean Ta (110) surface spreads over it as a stable monolayer, while the extra Cu atoms remain in the drop. The stability of a Cu monolayer and instability of thicker Cu films are consistent with recent experiments and first-principles calculations. This agreement demonstrates the utility of the potential for atomistic simulations of Cu-Ta interfaces.

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  • Received 26 December 2007

DOI:https://doi.org/10.1103/PhysRevB.77.094131

©2008 American Physical Society

Authors & Affiliations

Adham Hashibon1,2,*, Alexander Y. Lozovoi3, Yuri Mishin4, Christian Elsässer1,2, and Peter Gumbsch1,2

  • 1Fraunhofer-Institut für Werkstoffmechanik IWM, Wöhlerstraße 11, 79108 Freiburg, Germany
  • 2Institut für Zuverlässigkeit von Bauteilen und Systemen, Universität Karlsruhe (TH), Kaiserstraße 12, 76131 Karlsruhe, Germany
  • 3Atomistic Simulation Centre, School of Mathematics and Physics, Queen’s University of Belfast, Belfast, BT7 1NN Northern Ireland, United Kingdom
  • 4Department of Physics and Astronomy, MSN 3F3, George Mason University, Fairfax, Virginia 22030, USA

  • *adham.hashibon@iwm.fraunhofer.de

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Vol. 77, Iss. 9 — 1 March 2008

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