Electronic doping and scattering by transition metals on graphene

K. Pi, K. M. McCreary, W. Bao, Wei Han, Y. F. Chiang, Yan Li, S.-W. Tsai, C. N. Lau, and R. K. Kawakami
Phys. Rev. B 80, 075406 – Published 5 August 2009

Abstract

We investigate the effects of transition metals (TM) on the electronic doping and scattering in graphene using molecular-beam epitaxy combined with in situ transport measurements. The room-temperature deposition of TM onto graphene produces clusters that dope n type for all TM investigated (Ti, Fe, and Pt). We also find that the scattering by TM clusters exhibits different behavior compared to 1/r Coulomb scattering. At high coverage, Pt films are able to produce doping that is either n type or weakly p type, which provides experimental evidence for a strong interfacial dipole favoring n-type doping as predicted theoretically.

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  • Received 10 June 2009

DOI:https://doi.org/10.1103/PhysRevB.80.075406

©2009 American Physical Society

Authors & Affiliations

K. Pi, K. M. McCreary, W. Bao, Wei Han, Y. F. Chiang, Yan Li, S.-W. Tsai, C. N. Lau, and R. K. Kawakami*

  • Department of Physics and Astronomy, University of California, Riverside, California 92521, USA

  • *roland.kawakami@ucr.edu

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Issue

Vol. 80, Iss. 7 — 15 August 2009

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