Abstract
First-principles calculations have been performed to study the interface electronic structure of and to analyze the rectifying property of the structure. For the stoichiometric interface, the metal-induced gap states (MIGS) have amplitude appreciably only at the interface . We will show that the presence of MIGS makes oxygen-vacancy formation energy small at the interface. It is therefore expected that the interfacial layer can be easily reduced. We will then demonstrate that the Schottky barrier height is strongly affected by oxygen deficiency. According to the present calculation, the interface is of Schottky-contact type for the fully oxidized interfacial while it becomes almost ohmic for strongly reduced one.
1 More- Received 5 June 2009
DOI:https://doi.org/10.1103/PhysRevB.80.195302
©2009 American Physical Society