Anomalously strong pinning of the filling factor ν=2 in epitaxial graphene

T. J. B. M. Janssen, A. Tzalenchuk, R. Yakimova, S. Kubatkin, S. Lara-Avila, S. Kopylov, and V. I. Fal’ko
Phys. Rev. B 83, 233402 – Published 6 June 2011

Abstract

We explore the robust quantization of the Hall resistance in epitaxial graphene grown on Si-terminated SiC. Uniquely to this system, the dominance of quantum over classical capacitance in the charge transfer between the substrate and graphene is such that Landau levels (in particular, the one at exactly zero energy) remain completely filled over an extraordinarily broad range of magnetic fields. One important implication of this pinning of the filling factor is that the system can sustain a very high nondissipative current. This makes epitaxial graphene ideally suited for quantum resistance metrology, and we have achieved a precision of 3 parts in 1010 in the Hall resistance-quantization measurements.

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  • Received 8 April 2011

DOI:https://doi.org/10.1103/PhysRevB.83.233402

Published by the American Physical Society

Authors & Affiliations

T. J. B. M. Janssen1,*, A. Tzalenchuk1, R. Yakimova2, S. Kubatkin3, S. Lara-Avila3, S. Kopylov4, and V. I. Fal’ko4

  • 1National Physical Laboratory, Hampton Road, Teddington, TW11 0LW, United Kingdom
  • 2Department of Physics, Chemistry and Biology (IFM), Linköping University, S-581 83 Linköping, Sweden
  • 3Department of Microtechnology and Nanoscience, Chalmers University of Technology, S-412 96 Götenborg, Sweden
  • 4Physics Department, Lancaster University, Lancaster LA1 4YB, United Kingdom

  • *jt.janssen@npl.co.uk

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Issue

Vol. 83, Iss. 23 — 15 June 2011

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