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Nonstoichiometric doping and Bi antisite defect in single crystal Bi2Se3

F.-T. Huang, M.-W. Chu, H. H. Kung, W. L. Lee, R. Sankar, S.-C. Liou, K. K. Wu, Y. K. Kuo, and F. C. Chou
Phys. Rev. B 86, 081104(R) – Published 16 August 2012

Abstract

We studied the defects of Bi2Se3 generated from Bridgman growth of stoichiometric and nonstoichiometric self-fluxes. Growth habit, lattice size, and transport properties are strongly affected by the types of defects generated. Major defect types of the BiSe antisite and partial Bi2-layer intercalation are identified through combined studies of direct atomic-scale imaging with scanning transmission electron microscopy in conjunction with energy-dispersive x-ray spectroscopy, x-ray diffraction, and Hall effect measurements. We propose a consistent explanation to the origin of defect type, growth morphology, and transport property.

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  • Received 8 June 2012

DOI:https://doi.org/10.1103/PhysRevB.86.081104

©2012 American Physical Society

Authors & Affiliations

F.-T. Huang1, M.-W. Chu1, H. H. Kung2, W. L. Lee2, R. Sankar1, S.-C. Liou1, K. K. Wu1,3, Y. K. Kuo3, and F. C. Chou1,4,5,*

  • 1Center for Condensed Matter Sciences, National Taiwan University, Taipei 10617, Taiwan
  • 2Institute of Physics, Academia Sinica, Taipei 11529, Taiwan
  • 3Department of Physics, National Dong Hwa University, Hualien 97401, Taiwan
  • 4National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
  • 5Center for Emerging Material and Advanced Devices, National Taiwan University, Taipei 10617, Taiwan

  • *fcchou@ntu.edu.tw

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Vol. 86, Iss. 8 — 15 August 2012

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