Structural and electrical properties of metastable defects in hydrogenated amorphous silicon

J. Melskens, A. Schnegg, A. Baldansuren, K. Lips, M. P. Plokker, S. W. H. Eijt, H. Schut, M. Fischer, M. Zeman, and A. H. M. Smets
Phys. Rev. B 91, 245207 – Published 11 June 2015

Abstract

The structural and electrical properties of metastable defects in various types of hydrogenated amorphous silicon have been studied using a powerful combination of continuous wave electron-paramagnetic resonance spectroscopy, electron spin echo (ESE) decay measurements, and Doppler broadening positron annihilation spectroscopy. The observed dependence of the paramagnetic defect density on the Doppler S parameter indicates that porous, nanosized void-rich materials exhibit higher spin densities, while dense, divacancy-dominated materials show smaller spin densities. However, after light soaking more similar spin densities are observed, indicating a long-term defect creation process in the Staebler-Wronski effect that does not depend on the a-Si:H nanostructure. From ESE decays it appears that there are fast and slowly relaxing defect types, which are linked to various defect configurations in small and large open volume deficiencies. A nanoscopic model for the creation of light-induced defects in the a-Si:H nanostructure is proposed.

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  • Received 1 December 2014
  • Revised 22 May 2015

DOI:https://doi.org/10.1103/PhysRevB.91.245207

©2015 American Physical Society

Authors & Affiliations

J. Melskens1,*, A. Schnegg2, A. Baldansuren2,†, K. Lips2,‡, M. P. Plokker3, S. W. H. Eijt3, H. Schut4, M. Fischer1, M. Zeman1, and A. H. M. Smets1,§

  • 1Photovoltaic Materials and Devices, Faculty of Electrical Engineering, Mathematics and Computer Science, Delft University of Technology, Mekelweg 4, 2628 CD, Delft, Netherlands
  • 2Berlin Joint EPR lab, Institut für Silizium-Photovoltaik, Helmholtz-Zentrum Berlin für Materialen und Energie, Kekuléstrasse 5, 12489 Berlin, Germany
  • 3Fundamental Aspects of Materials and Energy, Faculty of Applied Sciences, Delft University of Technology, Mekelweg 15, 2629 JB, Delft, Netherlands
  • 4Neutron and Positron Methods in Materials, Faculty of Applied Sciences, Delft University of Technology, Mekelweg 15, 2629 JB, Delft, Netherlands

  • *Present address: Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, Netherlands; j.melskens@tue.nl
  • Present address: The Photon Science Institute, EPSRC National EPR Facility and Service, School of Chemistry, The University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom.
  • lips@helmholtz-berlin.de
  • §a.h.m.smets@tudelft.nl

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Issue

Vol. 91, Iss. 24 — 15 June 2015

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