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Random successive growth model for pattern formation

Wu Ziqin and Li Boquan
Phys. Rev. E 51, R16(R) – Published 1 January 1995
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Abstract

In order to explain patterns formed during crystallization of metal-semiconductor films and during bacterial colony growth, a random successive growth model where no long-range diffusion is necessary has been proposed. In this model the growth is controlled by two local conditions: growth probability of the neighboring sites around the cluster and occupation ratio of the sites of the cluster inside a small circle with the potential growth site as its center. Varying these conditions, fractal, dense-branching, and compact growth patterns have been obtained.

  • Received 1 July 1994

DOI:https://doi.org/10.1103/PhysRevE.51.R16

©1995 American Physical Society

Authors & Affiliations

Wu Ziqin

  • Fundamental Physics Center and Structure Research Laboratory, University of Science and Technology of China, Hefei, Anhui 230026, People’s Republic of China

Li Boquan

  • Chinese Center of Advanced Science and Technology (World Laboratory), P.O. Box 8730, Beijing 100080, People’s Republic of China
  • Fundamental Physics Center, University of Science and Technology of China, Hefei, Anhui 230026, People’s Republic of China

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Vol. 51, Iss. 1 — January 1995

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