Polarization Instability in Thin Ferroelectric Films

P. Wurfel, I. P. Batra, and J. T. Jacobs
Phys. Rev. Lett. 30, 1218 – Published 11 June 1973
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Abstract

An experimental study of critical phenomena in thin ferroelectric films is presented which, for the first time, conclusively demonstrates that the polarization in thin films is drastically reduced as a result of depolarization effects. Other causes, like impurities, structural defects, and domain formation, which can lead to reduction of polarization, are ruled out.

  • Received 18 May 1973

DOI:https://doi.org/10.1103/PhysRevLett.30.1218

©1973 American Physical Society

Authors & Affiliations

P. Wurfel*, I. P. Batra, and J. T. Jacobs

  • IBM Research Laboratory, San Jose, California 95193

  • *On leave from the University of Karlsruhe, Karlsruhe, Germany.

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Vol. 30, Iss. 24 — 11 June 1973

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