Work-Function Dependence of Negative-Ion Production during Sputtering

Ming L. Yu
Phys. Rev. Lett. 40, 574 – Published 27 February 1978
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Abstract

A systematic study was made of negative-ion formation by sputtering from a Mo(100) surface with and without adsorbate layers. Correlation with the work-function change when the surface electronic state was modified by a Cs overlayer reveals a possible tunneling mechanism. Tunnel barrier widths and heights were estimated for Mo, O, H, and D from the experimental data.

  • Received 13 December 1977

DOI:https://doi.org/10.1103/PhysRevLett.40.574

©1978 American Physical Society

Authors & Affiliations

Ming L. Yu

  • Brookhaven National Laboratory, Upton, New York 11973

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Issue

Vol. 40, Iss. 9 — 27 February 1978

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