Velocity Dependence of the Ionization Probability of Sputtered Atoms

Ming L. Yu
Phys. Rev. Lett. 47, 1325 – Published 2 November 1981; Erratum Phys. Rev. Lett. 47, 1765 (1981)
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Abstract

The velocity dependence of the ionization probability of sputtered O from chemisorbed oxygen layers on V and Nb is studied. The ionization probability is found to depend on the normal component of the emission velocity, which suggests that the ionization process is an ion-surface interaction and not an ion-atom binary interaction. For v>1×106 cm/sec, the ionization probability shows an exponential dependence on v. However, this velocity dependence fails at lower velocities.

  • Received 17 July 1981

DOI:https://doi.org/10.1103/PhysRevLett.47.1325

©1981 American Physical Society

Erratum

Authors & Affiliations

Ming L. Yu

  • IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598

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Issue

Vol. 47, Iss. 18 — 2 November 1981

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