Role of Relaxation in Epitaxial Growth: A Molecular-Dynamics Study

M. Schneider, A. Rahman, and Ivan K. Schuller
Phys. Rev. Lett. 55, 604 – Published 5 August 1985
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Abstract

The epitaxial growth of a Lennard-Jones system is studied as a function of substrate temperature Ts and deposition rate. For all substrate temperatures the growth is into well-ordered layers. Layers become fully completed at intermediate Ts. At very low Ts the layers contain defects and voids; however, the atoms are still arranged in close-packed islands within the layers.

  • Received 24 May 1985

DOI:https://doi.org/10.1103/PhysRevLett.55.604

©1985 American Physical Society

Authors & Affiliations

M. Schneider, A. Rahman, and Ivan K. Schuller

  • Materials Science and Technology Division, Argonne National Laboratory, Argonne, Illinois 60439

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Issue

Vol. 55, Iss. 6 — 5 August 1985

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