Formation of Schottky barrier at the Tm/GaAs(110) interface

M. Prietsch, M. Domke, C. Laubschat, and G. Kaindl
Phys. Rev. Lett. 60, 436 – Published 1 February 1988
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Abstract

Detailed photoemission studies of the Tm/GaAs(110) interface give clear evidence for an abrupt change in Fermi-level position at a relatively high Tm coverage (≃2.6 Å) by 0.22 eV towards the value expected from current-voltage measurements. This observation together with the strongly increasing density of states at the Fermi level around this coverage indicates that the Schottky barrier is not established until the overlayer assumes metallic character. The results are interpreted within the concept of metal-induced gap states defining the final Fermi-level position in Schottky barriers.

  • Received 17 November 1986

DOI:https://doi.org/10.1103/PhysRevLett.60.436

©1988 American Physical Society

Authors & Affiliations

M. Prietsch, M. Domke, C. Laubschat, and G. Kaindl

  • Institut für Atom- und Festköperphysik, Freie Universität Berlin, D-1000 Berlin 33, Germany

Comments & Replies

Schottky-Barrier Formation and Metallicity

William E. Spicer and Renyu Cao
Phys. Rev. Lett. 62, 605 (1989)

Prietsch et al. Reply

M. Prietsch, M. Domke, C. Laubschat, and G. Kaindl
Phys. Rev. Lett. 62, 607 (1989)

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Vol. 60, Iss. 5 — 1 February 1988

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