Si/SiO2 interface: New structures and well-defined model systems

Mark M. Banaszak Holl and F. Read McFeely
Phys. Rev. Lett. 71, 2441 – Published 11 October 1993
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Abstract

A well-defined silicon oxide/silicon interface way synthesized by the reaction of the precursor cluster H8Si8O12 with Si(100) surface and characterized using Si 2p core level photoemission spectroscopy. Information gained regarding the assignments of silicon oxide group shifts and peak widths is used to evaluate assumptions and assignments of photoemission spectra of silicon oxide interfaces.

  • Received 22 July 1993

DOI:https://doi.org/10.1103/PhysRevLett.71.2441

©1993 American Physical Society

Authors & Affiliations

Mark M. Banaszak Holl and F. Read McFeely

  • Department of Chemistry, Brown University, Providence, Rhode Island 02912
  • IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598

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Vol. 71, Iss. 15 — 11 October 1993

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