Atomic-scale mechanisms for surfactant-mediated layer-by-layer growth in homoepitaxy

Zhenyu Zhang and Max G. Lagally
Phys. Rev. Lett. 72, 693 – Published 31 January 1994
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Abstract

Atomic-scale mechanisms for surfactant-mediated layer-by-layer growth in homoepitaxy are investigated theoretically. Starting with minimal assumptions on relative bond strengths, we demonstrate that four possible mechanisms can be operative in enhancing layered growth: (1) a high density of islands at the initial growth stage of each layer, (2) a reduced activation barrier for atoms to cross steps, (3) incorporation into a growing island, and (4) an effective increase in the migration rate on top of the island. We assess the relative importance of these processes by computer simulations.

  • Received 14 October 1993

DOI:https://doi.org/10.1103/PhysRevLett.72.693

©1994 American Physical Society

Authors & Affiliations

Zhenyu Zhang and Max G. Lagally

  • University of Wisconsin–Madison, Madison, Wisconsin 53706

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Vol. 72, Iss. 5 — 31 January 1994

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