Surfactant-Induced Layer-by-Layer Growth on a Highly Anisotropic Substrate: Co/Cu(110)

Christian Tölkes, Rainer Struck, Rudolf David, Peter Zeppenfeld, and George Comsa
Phys. Rev. Lett. 80, 2877 – Published 30 March 1998
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Abstract

Using thermal energy helium atom scattering it is found that deposition of cobalt on the Cu(110)(2×1)O surface at 350 K leads to layer-by-layer growth of a pseudomorphic fcc(110) Co film. Auger electron spectroscopy reveals that the surface is O terminated even after deposition of more than 20 monolayer Co. A (3×1) superstructure is observed in the topmost Co layer, suggesting that the Co(110) phase is stabilized by an oxygen induced surface reconstruction.

  • Received 22 October 1997

DOI:https://doi.org/10.1103/PhysRevLett.80.2877

©1998 American Physical Society

Authors & Affiliations

Christian Tölkes, Rainer Struck, and Rudolf David

  • Institut für Grenzflächenforschung und Vakuumphysik, Forschungszentrum Jülich, D-52425 Jülich, Germany

Peter Zeppenfeld

  • Institut für Experimentalphysik, Johannes-Kepler-Universität Linz, A-4040 Linz, Austria

George Comsa

  • Institut für Physikalische und Theoretische Chemie, Wegelerstraße 12, D-53113 Bonn, Germany

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Issue

Vol. 80, Iss. 13 — 30 March 1998

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