Negative Domain Wall Contribution to the Resistivity of Microfabricated Fe Wires

U. Ruediger, J. Yu, S. Zhang, A. D. Kent, and S. S. P. Parkin
Phys. Rev. Lett. 80, 5639 – Published 22 June 1998
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Abstract

The effect of domain walls on electron transport has been investigated in microfabricated Fe wires (0.65 to 20μm linewidths) with controlled stripe domains. Magnetoresistance (MR) measurements as a function of domain wall density, temperature, and the angle of the applied field are used to determine the low field MR contributions due to conventional sources in ferromagnetic materials and that due to the erasure of domain walls. A negative domain wall contribution to the resistivity is found. This result is discussed in light of a recent theoretical study of the effect of domain walls on quantum transport.

  • Received 5 January 1998

DOI:https://doi.org/10.1103/PhysRevLett.80.5639

©1998 American Physical Society

Authors & Affiliations

U. Ruediger, J. Yu, S. Zhang, and A. D. Kent*

  • Department of Physics, New York University, 4 Washington Place, New York, New York 10003

S. S. P. Parkin

  • IBM Research Division, Almaden Research Center, San Jose, California 95120-6099

  • *Electronic address: andy.kent@nyu.edu

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Vol. 80, Iss. 25 — 22 June 1998

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