Energy Dissipation in Atomic Force Microscopy and Atomic Loss Processes

Peter M. Hoffmann, Steve Jeffery, John B. Pethica, H. Özgür Özer, and Ahmet Oral
Phys. Rev. Lett. 87, 265502 – Published 6 December 2001
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Abstract

Atomic scale dissipation is of great interest in nanomechanics and atomic manipulation. We present dissipation measurements with a linearized, ultrasmall amplitude atomic force microscope which is capable of measuring dissipation at chosen, fixed separations. We show that the dynamic dissipation in the noncontact regime is of the order of a few 10–100 meV per cycle. This dissipation is likely due to the motion of a bistable atomic defect in the tip-surface region. In the contact regime we observe dc hysteresis associated with nanoscale plasticity. We find the hysteretic energy loss to be 1 order of magnitude higher for a silicon surface than for copper.

  • Received 24 May 2001

DOI:https://doi.org/10.1103/PhysRevLett.87.265502

©2001 American Physical Society

Authors & Affiliations

Peter M. Hoffmann*

  • Department of Physics, Wayne State University, 666 W. Hancock, Detroit, Michigan 48201

Steve Jeffery and John B. Pethica

  • Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom

H. Özgür Özer and Ahmet Oral

  • Department of Physics, Bilkent University, Ankara, Turkey

  • *Electronic address: hoffmann@physics.wayne.edu

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Issue

Vol. 87, Iss. 26 — 24 December 2001

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