Silicon Monoxide Clusters: The Favorable Precursors for Forming Silicon Nanostructures

R. Q. Zhang, M. W. Zhao, and S. T. Lee
Phys. Rev. Lett. 93, 095503 – Published 26 August 2004

Abstract

Using density-functional calculations, we show that the energetically favorable configurations of silicon monoxide clusters (SiO)n for n5 facilitate the nucleation and growth of silicon nanostructures as the clusters contain sp3 silicon cores surrounded by silicon oxide sheaths. The frontier orbitals of (SiO)n clusters are localized to a significant degree on the silicon atoms on the surface, providing high reactivity for further stacking with other clusters. The oxygen atoms in the formed larger clusters prefer to migrate from the centers to the exterior surfaces, leading to the growth of sp3 silicon cores.

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  • Received 2 February 2004

DOI:https://doi.org/10.1103/PhysRevLett.93.095503

©2004 American Physical Society

Authors & Affiliations

R. Q. Zhang1,2, M. W. Zhao1, and S. T. Lee1,2

  • 1Centre of Super-Diamond and Advanced Films (COSDAF) and Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR, China
  • 2Nano-Organic Photoelectronic Laboratory, Technical Institute of Physics and Chemistry, The Chinese Academy of Sciences, Beijing, 100101, China

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Issue

Vol. 93, Iss. 9 — 27 August 2004

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