Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas

Shinsuke Fujioka, Hiroaki Nishimura, Katsunobu Nishihara, Akira Sasaki, Atsushi Sunahara, Tomoharu Okuno, Nobuyoshi Ueda, Tsuyoshi Ando, Yezheng Tao, Yoshinori Shimada, Kazuhisa Hashimoto, Michiteru Yamaura, Keisuke Shigemori, Mitsuo Nakai, Keiji Nagai, Takayoshi Norimatsu, Takeshi Nishikawa, Noriaki Miyanaga, Yasukazu Izawa, and Kunioki Mima

Phys. Rev. Lett. 95, 235004 – Published 29 November 2005

Abstract

Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been experimentally investigated. An absorption spectrum of a uniform Sn plasma generated by thermal x rays has been measured in the EUV range (9–19 nm wavelength) for the first time. Experimental results indicate that control of the optical depth of the laser-produced Sn plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation; 1.8% of the conversion efficiency was attained with the use of 2.2 ns laser pulses.

Received 22 September 2005

DOI:https://doi.org/10.1103/PhysRevLett.95.235004

Authors & Affiliations

Shinsuke Fujioka^1,*, Hiroaki Nishimura¹, Katsunobu Nishihara¹, Akira Sasaki², Atsushi Sunahara³, Tomoharu Okuno¹, Nobuyoshi Ueda¹, Tsuyoshi Ando¹, Yezheng Tao¹, Yoshinori Shimada³, Kazuhisa Hashimoto³, Michiteru Yamaura³, Keisuke Shigemori¹, Mitsuo Nakai¹, Keiji Nagai¹, Takayoshi Norimatsu¹, Takeshi Nishikawa⁴, Noriaki Miyanaga¹, Yasukazu Izawa¹, and Kunioki Mima¹

¹Institute of Laser Engineering, Osaka University, 2-6 Yamada-Oka, Suita, Osaka 565-0871, Japan
²Advanced Photon Research Center, Kansai Research Establishment, Japan Atomic Energy Research Institute, 8-1 Umemidai, Kizu, Kyoto 619-0215, Japan
³Institute for Laser Technology, 2-6 Yamada-Oka, Suita, Osaka 565-0871, Japan
⁴Department of Electrical and Electronic Engineering, Okayama University, 1-1 Naka 1-chome, Tsushima, Okayama 700-8350, Japan

^*Electronic address: sfujioka@ile.osaka-u.ac.jp

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Issue

Vol. 95, Iss. 23 — 2 December 2005

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