Interfaces of Correlated Electron Systems: Proposed Mechanism for Colossal Electroresistance

Takashi Oka and Naoto Nagaosa
Phys. Rev. Lett. 95, 266403 – Published 23 December 2005

Abstract

Mott’s metal-insulator transition at an interface due to band bending is studied by the density matrix renormalization group approach. We show that the result can be recovered by a simple modification of the conventional Poisson’s equation approach used in semiconductor heterojunctions. A novel mechanism of colossal electroresistance is proposed, which incorporates the hysteretic behavior of the transition in higher dimensions.

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  • Received 2 September 2005

DOI:https://doi.org/10.1103/PhysRevLett.95.266403

©2005 American Physical Society

Authors & Affiliations

Takashi Oka1 and Naoto Nagaosa1,2,3

  • 1Correlated Electron Research Center (CERC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 4, Tsukuba 305-8562, Japan
  • 2Department of Applied Physics, University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan
  • 3CREST, Japan Science and Technology Corporation (JST), Saitama, 332-0012, Japan

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Issue

Vol. 95, Iss. 26 — 31 December 2005

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