Abstract
Mott’s metal-insulator transition at an interface due to band bending is studied by the density matrix renormalization group approach. We show that the result can be recovered by a simple modification of the conventional Poisson’s equation approach used in semiconductor heterojunctions. A novel mechanism of colossal electroresistance is proposed, which incorporates the hysteretic behavior of the transition in higher dimensions.
- Received 2 September 2005
DOI:https://doi.org/10.1103/PhysRevLett.95.266403
©2005 American Physical Society