Disorder and localization dynamics in polymorphs of the molecular semiconductor pentacene probed by in situ micro-Raman spectroscopy and molecular dynamics simulations

Masahiko Ando, Makoto Yoneya, Thomas B. Kehoe, Hiroyuki Ishii, Takashi Minakata, Masahiro Kawasaki, Claudia M. Duffy, Richard Phillips, and Henning Sirringhaus
Phys. Rev. Materials 3, 025601 – Published 19 February 2019
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Abstract

To reveal the relationship between microstructural disorder and charge localization dynamics in a van-der-Waals-bonded molecular semiconductor, the electrical properties of field-effect transistors with zone-cast pentacene films were characterized by using in situ micro-Raman spectroscopy to monitor the films’ intermolecular and intramolecular vibrations. Transformations from a high-temperature phase with reduced molecular vibration along the long axis that were induced by electron localization in pentacene molecules at the channel interface and transformations from a low-temperature phase with increased molecular vibration that were induced by the electron delocalization were clearly observed under gate-bias stress, photoexcitation, and thermal annealing. Multilayer molecular dynamics simulations revealed that electrons should be localized in each pentacene molecule to stabilize the low-temperature phase and that the intramolecular Raman peak corresponds to the amount of out-of-plane molecular displacement that is most influential to charge localization and mobility reduction induced by fluctuating transfer integrals. We propose a unified picture to describe the relationship between out-of-plane structural disorder and charge localization dynamics in pentacene polymorphs.

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  • Received 8 October 2017
  • Revised 8 January 2019

DOI:https://doi.org/10.1103/PhysRevMaterials.3.025601

©2019 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied PhysicsPolymers & Soft Matter

Authors & Affiliations

Masahiko Ando1,*, Makoto Yoneya2, Thomas B. Kehoe3, Hiroyuki Ishii4, Takashi Minakata5, Masahiro Kawasaki1, Claudia M. Duffy3, Richard Phillips3, and Henning Sirringhaus3

  • 1R&D group, Hitachi, Ltd., 1–280 Higashi-Koigakubo, Kokubunji, Tokyo 185–8601, Japan
  • 2Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, 305–8568, Japan
  • 3Cavendish Laboratory, JJ Thomson Avenue, Cambridge, CB3 0HE, United Kingdom
  • 4University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305–8573, Japan
  • 5Asahi-Kasei Corporation, R&D Centre, 2-1 Samejima, Fuji, Shizuoka, 416–0934, Japan

  • *Author to whom correspondence should be addressed: masahiko.ando.ph@hitachi.com

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Issue

Vol. 3, Iss. 2 — February 2019

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