Local atomic order and element-specific magnetic moments of Fe3Si thin films on MgO(001) and GaAs(001) substrates

B. Krumme, C. Weis, H. C. Herper, F. Stromberg, C. Antoniak, A. Warland, E. Schuster, P. Srivastava, M. Walterfang, K. Fauth, J. Minár, H. Ebert, P. Entel, W. Keune, and H. Wende
Phys. Rev. B 80, 144403 – Published 9 October 2009

Abstract

We investigated the magnetic as well as the structural properties of Fe3Si films on GaAs(001)(4×6), GaAs(001)(2×2), and MgO(001) by x-ray magnetic circular dichroism (XMCD) and Mössbauer spectroscopy. From the XMCD spectra we determine averaged magnetic moments of 1.31.6μB per Fe atom on the different substrates by a standard sum-rule analysis. In addition, XMCD spectra have been calculated by using the multiple-scattering Korringa-Kohn-Rostoker method which allows the site-specific discussion of the x-ray spectra. The Mössbauer spectra show a highly ordered and stoichiometric growth of Fe3Si on MgO while the growth on both GaAs substrates is strongly perturbed, probably due to diffusion of substrate atoms into the Fe3Si film. Therefore, we have studied the influence of Ga or As impurities on the magnetic properties of Fe3Si by calculations using coherent-potential approximation within the Korringa-Kohn-Rostoker method. For selected impurity concentrations additional supercell calculations have been performed using a pseudopotential code (VASP).

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  • Received 21 May 2009

DOI:https://doi.org/10.1103/PhysRevB.80.144403

©2009 American Physical Society

Authors & Affiliations

B. Krumme1,*, C. Weis1, H. C. Herper1, F. Stromberg1, C. Antoniak1, A. Warland1, E. Schuster1, P. Srivastava1,†, M. Walterfang1, K. Fauth2, J. Minár3, H. Ebert3, P. Entel1, W. Keune1,4, and H. Wende1

  • 1Fachbereich Physik and Center for Nanointegration Duisburg-Essen (CeNIDE), Universität Duisburg-Essen, Lotharstraße 1, D-47048 Duisburg, Germany
  • 2Experimentelle Physik IV, Physikalisches Institut, Universität Würzburg, Am Hubland, D-97072 Würzburg, Germany
  • 3Institut für Physikalische Chemie, Universität München, Butenandtstraße 5-13, D-81377 München, Germany
  • 4Max-Planck-Institut für Mikrostrukturphysik, Weinberg 2, D-06120 Halle, Germany

  • *Corresponding author; bernhard.krumme@stud.uni-due.de
  • Permanent address: Nanostech Laboratory, Indian Institute of Technology Delhi, New Delhi 110 016, India.

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Issue

Vol. 80, Iss. 14 — 1 October 2009

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