Strain and charge carrier coupling in epitaxial graphene

Diedrich A. Schmidt, Taisuke Ohta, and Thomas E. Beechem
Phys. Rev. B 84, 235422 – Published 5 December 2011
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Abstract

We report a striking coupling between strain and carrier concentration variations at micrometer scale in single-layer graphene grown on silicon carbide (SiC) (0001). The in-plane compressive strain (up to 0.4%) and carrier concentration are probed using Raman spectroscopy. We show that the large strain inhomogeneities in graphene initiate at the growth stage and develop further by strain relaxation along the mismatched symmetry axes of the graphene and the underlying substrate. The strain relaxation is accompanied by a locally larger electron concentration, suggesting that charge transfer reduces the strain energy in the overall system. Our work establishes the strain and doping variations as coupled, intrinsic properties of epitaxial graphene growth on SiC(0001).

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  • Received 11 October 2010

DOI:https://doi.org/10.1103/PhysRevB.84.235422

©2011 American Physical Society

Authors & Affiliations

Diedrich A. Schmidt1,*, Taisuke Ohta2,†, and Thomas E. Beechem2

  • 1Department of Physical Chemistry II, Ruhr-University Bochum, Bochum D-NRW 44780, Germany
  • 2Sandia National Laboratories, Albuquerque, New Mexico 87185, USA

  • *Corresponding author: Diedrich. Schmidt@rub.de; On leave: Department of Physics, North Carolina A&T State University, Greensboro, North Carolina 27411, USA.
  • tohta@sandia.gov

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Issue

Vol. 84, Iss. 23 — 15 December 2011

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