Optical-field-induced Electron Emission in a dc-Biased Nanogap

Yi Luo and Peng Zhang
Phys. Rev. Applied 17, 044008 – Published 5 April 2022

Abstract

We construct an analytical formulation for nonlinear photoelectron emission in a dc-biased metallic nanovacuum gap triggered by a laser field, by exactly solving the one-dimensional time-dependent Schrödinger equation. We theoretically investigate the photoelectron energy spectra and emission current from left- and right-side surfaces of the asymmetric nanojunction with various dc biases, laser fields, and gap distances. The underlying photoemission mechanisms transitioning form multiphoton over-barrier emission to photon-assisted field tunneling, and the spatiotemporal dynamics of electron transport inside the gap are analyzed in detail. Our calculation shows applying a dc field could greatly reduce the interference oscillation in the transmission current in the nanogap, due to the shift of dominant emission away from the multiphoton over-barrier regime. Our results demonstrate that, besides the dc bias, varying the gap spacing could strongly influence the rectification on the photoelectron emission in a dc-biased metal-vacuum-metal gap. Our study provides useful guideline to the design of ultrafast nanogap-based signal rectification devices, such as photoelectron emitters and photodetectors, by choosing an optimal combination of dc bias, gap spacing, and material properties.

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  • Received 21 December 2021
  • Revised 1 March 2022
  • Accepted 21 March 2022

DOI:https://doi.org/10.1103/PhysRevApplied.17.044008

© 2022 American Physical Society

Physics Subject Headings (PhySH)

Accelerators & BeamsCondensed Matter, Materials & Applied PhysicsNonlinear DynamicsAtomic, Molecular & OpticalInterdisciplinary PhysicsGeneral Physics

Authors & Affiliations

Yi Luo and Peng Zhang*

  • Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824-1226, USA

  • *pz@egr.msu.edu
  • Present address: Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA.

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Vol. 17, Iss. 4 — April 2022

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