Dipole-Engineering Strategy for Regulating the Electronic Contact of a Two-Dimensional SbX/Graphene (X = P, As, Bi) van der Waals Interface

Jing Li, Wenqiang Liu, Wenhan Zhou, Jialin Yang, Hengze Qu, Yang Hu, and Shengli Zhang
Phys. Rev. Applied 17, 054009 – Published 5 May 2022
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Abstract

A Schottky barrier, formed in the contact of a two-dimensional (2D) semiconductor and metal electrode, seriously degrades device performance. Herein, we propose a dipole-engineering strategy to regulate the electronic contact properties of a 2D polar SbX (X = P, As, Bi) and graphene (Gr) van der Waals interface. Owing to the mirror asymmetry of SbX, we construct seven vertical heterostructures in the form of XSb-Gr and SbXGr. Tunable Schottky barrier height and contact type can be obtained by using different atomic terminals to contact with Gr. Based on the first-principles calculations, the dipole and its associated potential step are found to be responsible for the regulating effect. Moreover, owing to the remarkable properties of the SbBi-Gr heterostructure, such as Ohmic contact and low tunneling barrier, we design an optoelectronic field-effect transistor, which exhibits considerable responsivity (0.089 AW1) and external quantum efficiency (28.57%). Our findings further confirm that regulating the electronic contact properties by the dipole in the heterostructure is a feasible strategy, which provides meaningful guidance for designing high-performance electronic and optoelectronic devices.

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  • Received 21 October 2021
  • Revised 14 March 2022
  • Accepted 14 April 2022

DOI:https://doi.org/10.1103/PhysRevApplied.17.054009

© 2022 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Jing Li, Wenqiang Liu, Wenhan Zhou, Jialin Yang, Hengze Qu, Yang Hu, and Shengli Zhang*

  • MIIT Key Laboratory of Advanced Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, China

  • *zhangslvip@njust.edu.cn

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Vol. 17, Iss. 5 — May 2022

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