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Unveiling the mechanisms of the spin Hall effect in Ta

Edurne Sagasta, Yasutomo Omori, Saül Vélez, Roger Llopis, Christopher Tollan, Andrey Chuvilin, Luis E. Hueso, Martin Gradhand, YoshiChika Otani, and Fèlix Casanova
Phys. Rev. B 98, 060410(R) – Published 22 August 2018
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Abstract

Spin-to-charge current interconversions are widely exploited for the generation and detection of pure spin currents and are key ingredients for future spintronic devices including spin-orbit torques and spin-orbit logic circuits. In the case of the spin Hall effect, different mechanisms contribute to the phenomenon and determining the leading contribution is peremptory for achieving the largest conversion efficiencies. Here, we experimentally demonstrate the dominance of the intrinsic mechanism of the spin Hall effect in highly resistive Ta. We obtain an intrinsic spin Hall conductivity for β-Ta of 820±120(/e)Ω1cm1 from spin absorption experiments in a large set of lateral spin valve devices. The predominance of the intrinsic mechanism in Ta allows us to linearly enhance the spin Hall angle by tuning the resistivity of Ta, reaching up to −35 ± 3%, the largest reported value for a pure metal.

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  • Received 15 May 2018

DOI:https://doi.org/10.1103/PhysRevB.98.060410

©2018 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Edurne Sagasta1, Yasutomo Omori2, Saül Vélez1,*, Roger Llopis1, Christopher Tollan1, Andrey Chuvilin1,3, Luis E. Hueso1,3, Martin Gradhand4, YoshiChika Otani2,5, and Fèlix Casanova1,3,†

  • 1CIC nanoGUNE, 20018 Donostia-San Sebastian, Basque Country, Spain
  • 2Institute for Solid State Physics, University of Tokyo, Kashiwa, Chiba 277-8581, Japan
  • 3IKERBASQUE, Basque Foundation for Science, 48013 Bilbao, Basque Country, Spain
  • 4H. H. Wills Physics Laboratory, University of Bristol, Bristol BS8 1TL, United Kingdom
  • 5RIKEN-CEMS, 2-1 Hirosawa, Wako, Saitama 351-0198, Japan

  • *Present address: Department of Materials, ETH Zürich, 8093 Zürich, Switzerland.
  • Corresponding author: f.casanova@nanogune.eu

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Issue

Vol. 98, Iss. 6 — 1 August 2018

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