Influence of surface roughness on the optical mode profile in GaN-based violet ridge waveguide laser diodes

Katarzyna Holc; Annik Jakob; Thomas Weig; Klaus Köhler; Oliver Ambacher; Ulrich T. Schwarz

doi:10.1117/12.2037336

27 February 2014 Influence of surface roughness on the optical mode profile in GaN-based violet ridge waveguide laser diodes

Katarzyna Holc, Annik Jakob, Thomas Weig, Klaus Köhler, Oliver Ambacher, Ulrich T. Schwarz

Author Affiliations +

Proceedings Volume 9002, Novel In-Plane Semiconductor Lasers XIII; 90020I (2014) https://doi.org/10.1117/12.2037336
Event: SPIE OPTO, 2014, San Francisco, California, United States

Abstract

We investigate the influence of the epitaxial layer roughness on the far-field profile of the optical mode in gallium Nitride-based, c-plane ridge waveguide laser diodes. Occasionally, we observe long-range growth instabilities leading to a periodical modulation of the surface. Amplitude and period of this surface roughness is typically on the order of a few 10nm and 20 μm, respectively. Using different characterization techniques, we investigate the influence of the surface roughness on the vertical mode profile along the fast axis in the far-field, in particular the contribution of light scattering at the rough waveguide interfaces, as well as that of substrate modes.

Citation Download Citation

Katarzyna Holc, Annik Jakob, Thomas Weig, Klaus Köhler, Oliver Ambacher, and Ulrich T. Schwarz "Influence of surface roughness on the optical mode profile in GaN-based violet ridge waveguide laser diodes", Proc. SPIE 9002, Novel In-Plane Semiconductor Lasers XIII, 90020I (27 February 2014); https://doi.org/10.1117/12.2037336

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