Paper
6 September 1995 Refractive index profiling of planar optical waveguides using near-field scanning optical microscopy
Lisa Dhar, H. J. Lee, E. J. Laskowski, Steve K. Buratto, Chellappan Narayanan, Herman M. Presby, Charles C. Bahr, Phillip J. Anthony, Mark J. Cardillo
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Abstract
The refractive index profile of a straight channel phosphosilicate glass planar optical waveguide is obtained with high spatial resolution (approximately 0.25 micrometers ) using near- field scanning optical microscopy (NSOM). The optical intensity profile of the waveguide mode is measured by NSOM and the refractive index distribution is calculated from the measured intensity. The calculated refractive index distribution is in agreement with that expected from the fabrication procedure and provides evidence for phosphorous diffusion between the core and cladding regions.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lisa Dhar, H. J. Lee, E. J. Laskowski, Steve K. Buratto, Chellappan Narayanan, Herman M. Presby, Charles C. Bahr, Phillip J. Anthony, and Mark J. Cardillo "Refractive index profiling of planar optical waveguides using near-field scanning optical microscopy", Proc. SPIE 2535, Near-Field Optics, (6 September 1995); https://doi.org/10.1117/12.218696
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Cited by 7 scholarly publications.
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KEYWORDS
Refractive index

Near field scanning optical microscopy

Waveguides

Cladding

Chemical vapor deposition

Channel waveguides

Near field optics

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