Microfocusing optics for hard xrays fabricated by x-ray lithography

Azalia A. Krasnoperova; Zheng Chen; Franco Cerrina; Enzo M. Di Fabrizio; Massimo Gentili; Wenbing Yun; Barry P. Lai; Efim S. Gluskin

doi:10.1117/12.221670

25 September 1995 Microfocusing optics for hard xrays fabricated by x-ray lithography

Azalia A. Krasnoperova, Zheng Chen, Franco Cerrina, Enzo M. Di Fabrizio, Massimo Gentili, Wenbing Yun, Barry P. Lai, Efim S. Gluskin

Author Affiliations +

Proceedings Volume 2516, X-Ray Microbeam Technology and Applications; (1995) https://doi.org/10.1117/12.221670
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

Lithographic techniques for fabrication of hard x-ray Fresnel zone plates are discussed. Practical results achieved at the Center for X-ray Lithography of the University of Wisconsin- Madison are presented. Fabrication technology includes replication of an e-beam written master mask into a thick photoresist by synchrotron radiation x-ray lithography, and subsequent electroplating of a metal zone plate structure using photoresist pattern as a mold.

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Azalia A. Krasnoperova, Zheng Chen, Franco Cerrina, Enzo M. Di Fabrizio, Massimo Gentili, Wenbing Yun, Barry P. Lai, and Efim S. Gluskin "Microfocusing optics for hard xrays fabricated by x-ray lithography", Proc. SPIE 2516, X-Ray Microbeam Technology and Applications, (25 September 1995); https://doi.org/10.1117/12.221670

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