Transmittance measurement with interferometer system

Hideo Takizawa; Haruhiko Kusunose; Naoki Awamura; Kouji Miyazaki; Takahiro Ode; Daikichi Awamura

doi:10.1117/12.245226

24 July 1996 Transmittance measurement with interferometer system

Hideo Takizawa, Haruhiko Kusunose, Naoki Awamura, Kouji Miyazaki, Takahiro Ode, Daikichi Awamura

Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245226
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan

Abstract

Transmittance measurement of small object such as Ga-stain of repair or particle on photomask is getting to be important. This paper. describes the characteristic of transmittance measurement with a shearing interferometer microscope comparing with a conventional method. Measurement wavelength are 436, 365 and 248nm. In this system the transmittance is calculated from interference signal amplitude that is free from a flare light caused by reflection of optical parts.

Citation Download Citation

Hideo Takizawa, Haruhiko Kusunose, Naoki Awamura, Kouji Miyazaki, Takahiro Ode, and Daikichi Awamura "Transmittance measurement with interferometer system", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245226

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available